- MBE 8000 joins
Riber's systems catalog - Twice the productivity of existing products
- Outstanding uniformities achievements
- High performance reproducibility across run after run
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A new competitive edge for our customers
The MBE 8000 delivers twice the productivity of existing products on the market while enabling outstanding performances. The flexibility of MBE technology enables RIBER’s MBE 8000 to address all compound semiconductor growing markets from VCSEL, transistor, sensors requiring high level of performances in terms of uniformity, reproducibility, and stability.
This system is capable of growing batches of eight 150 mm (6 inches) or four 200 mm (8 inches) wafers, increasing capacity by 50% over the existing products. As cell design, system geometry, process control are identical, it ensures process transfer within a minimum of time and an easy handling for
The final qualification step has validated the MBE 8000 in terms of process, robustness, stability, ergonomics, and control. As an example, defect density over 30 runs measured is less than 50 particles per cm² measured on a VCSEL-type structure and on particles in the size of 0.8-8µm.
With an optimum cost of ownership and large capacity, the MBE 8000 system presents strong prospects for business development in the future.
To find out more, information on the MBE 8000 is available at the following link.
Best achievements reported :
- Thickness uniformity of InGaAs/GaAs superlattices over the 8x6’’ platen: 298Å ± 2 Å
- Fabry-Perot dip uniformity of resonator wafers over 8x6” platen: 3nm
- HEMT electron mobility: 178 000 cm²V-1s-1 at 77K
About
Accelerating the performance of electronics, RIBER’s equipment performs an essential role in the development of advanced semiconductor systems that are used in numerous applications, from information technologies to photonics (lasers, sensors, etc.), 5G telecommunications networks and research including the field of quantum computing.
www.riber.com
Contacts
CALYPTUS :
Attachment
- Communiqué de presse MBE 8000 19122023 Vdef_E
© OMX, source