Lam Research Corp. introduced the world's first production-oriented pulsed laser deposition (PLD) tool to enable next-generation MEMS-based microphones and radio frequency (RF) filters. Lam's Pulsus?

PLD system delivers aluminum scandium nitride (AlScN) films with the higher scandium content available. This paves the way for advanced consumer and automotive devices with enhanced performance, capability and functionality. Pulsus is now shipping to select specialty device manufacturers.

The addition of Pulsus PLD to the Lam portfolio further expands Lam's comprehensive range of deposition, etch and single-wafer clean products focused on specialty technologies and demonstrates Lam's continuous innovation in this sector. Cutting-Edge Films Drive High Performance Devices: RF filters play a critical role in 5G, WiFi 6 and WiFi 6E performance by increasing the number of bands a network can handle while also improving each user's experience. MEMS microphones are valued for a high signal-to-noise ratio that allows them to capture even muffled sounds accurately -- essential for voice control features and noise cancellation in 5G-enabled devices.

Pulsus uses breakthrough technology to deposit high-quality films that optimize RF filters and MEMS microphones. The higher the scandium level in the film, the better the performance of the devices. Pulsus delivers films composed of at least 40% scandium - the higher concentration available now.

These films feature low dielectric loss and twice the piezo coefficient of current sputtered films, optimizing electrical conversion to drive enhanced sensitivity in RF filters and better performance in MEMS microphones. Further, improved piezoelectric qualities make it feasible to replace lead zirconate titanate (PZT) with lead-free AlScN. In Pulsus' PLD process, an intense laser pulse is used to strike a target material.

The target is vaporized, creating a stable, dense plasma plume that is deposited in thin layers onto a wafer. This process is vital for achieving high-quality, uniform films with precise control over thickness and stress. Pulsus represents the first time lasers have been used for thin film deposition in high-volume manufacturing.

The PLD capabilities of Pulsus, supported by Lam's 2300 platform design, ensure exceptional film uniformity and quality at a fraction of the cost per wafer versus conventional deposition methods. This efficiency can help chipmakers boost manufacturing yields and accelerate their product roadmaps. In addition to AlScN, Pulsus can deposit a wide range of complex, multi-element materials that cannot be applied by other methods.

Lam is exploring new materials to meet the demands of the specialty technology market for applications such as AR/VR and quantum computing.