Ion Electronic Materials Co., Ltd. Stock

Equities

6959

TW0006959000

Commodity Chemicals

End-of-day quote Taipei Exchange 06:00:00 2024-05-08 pm EDT 5-day change 1st Jan Change
149.5 TWD -2.92% Intraday chart for Ion Electronic Materials Co., Ltd. -13.08% +27.78%
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Sales 2022 943M 29.14M Sales 2023 469M 14.49M Capitalization 3.94B 122M
Net income 2022 105M 3.24M Net income 2023 88M 2.72M EV / Sales 2022 * -
Net cash position 2022 567M 17.5M Net cash position 2023 211M 6.52M EV / Sales 2023 7.94 x
P/E ratio 2022 *
-
P/E ratio 2023
45 x
Employees 23
Yield 2022 *
-
Yield 2023
1.04%
Free-Float 97.03%
More Fundamentals * Assessed data
Dynamic Chart
1 day-2.92%
1 week-13.08%
Current month-13.08%
1 month-11.80%
3 months+24.58%
6 months+51.32%
Current year+27.78%
More quotes
1 week
143.00
Extreme 143
168.50
1 month
142.50
Extreme 142.5
183.00
Current year
100.00
Extreme 100
183.00
1 year
89.70
Extreme 89.7
191.00
3 years
89.70
Extreme 89.7
191.00
5 years
89.70
Extreme 89.7
191.00
10 years
89.70
Extreme 89.7
191.00
More quotes
Date Price Change Volume
24-05-09 149.5 -2.92% 464,956
24-05-08 154 +0.65% 327,724
24-05-07 153 -1.29% 1,022,425
24-05-06 155 -3.12% 783,367
24-05-03 160 -3.61% 728,247

End-of-day quote Taipei Exchange, May 08, 2024

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Ion Electronic Materials Co Ltd is engaged in the provision of specialty gases and machineries. The Company's businesses include the production and sales of special gases and machineries. Special gases include dopant gas, clean and etchant gas, CVD thin-film gas and laser litho gas. Dopant gas are used as special gases for semiconductor ion implantation process and after implantation, including arsine, phosphine, boron trifluoride (11B), 11B enriched boron trifluoride and germanium tetrafluoride. Clean and etchant gas are nitrogen trifluoride, used as cleaning gas in semiconductors and liquid crystal panels, as well as F2/N2 Mixture Gas, used in electronics, laser technology and medical equipment. CVD thin-film gas includes SiH4, Si2H6, DCS and TCS used in semiconductor. Laser litho gas includes ArF193nm, KrF248nm, laser annealing gas, Ne and Kr used in photoresist process. Machineries are used for special gas refilling.
More about the company
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