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Lam Research : New Nanotechnology Data Have Been Reported by A.P. Lane and Co-Authors (Directed Self-Assembly and Pattern Transfer of Five Nanometer Block Copolymer...

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08/03/2017 | 07:44 pm

New Nanotechnology Data Have Been Reported by A.P. Lane and Co-Authors (Directed Self-Assembly and Pattern Transfer of Five Nanometer Block Copolymer Lamellae)

By a News Reporter-Staff News Editor at Nanotechnology Weekly -- New research on Nanotechnology is the subject of a report. According to news reporting originating from Fremont, California, by VerticalNews correspondents, research stated, "The directed self-assembly (DSA) and pattern transfer of poly(5-vinyl-1,3-benzodioxole-block-pentamethyldisilylstyrene) (PVBD-b-PDSS) is reported. Lamellae-forming PVBD-b-PDSS can form well resolved 5 nm (half-pitch) features in thin films with high etch selectivity."

Financial supporters for this research include Welch Foundation, Division of Graduate Education, Division of Engineering Education and Centers, Division of Electrical, Communications and Cyber Systems, Lam Research Corporation, Association of Science-Technology Centers, Seagate Technology PLC, Board of Regents, University of Texas System.

Our news editors obtained a quote from the research, "Reactive ion etching was used to selectively remove the PVBD block, and fingerprint patterns were subsequently transferred into an underlying chromium hard mask and carbon layer. DSA of the block copolymer (BCP) features resulted from orienting PVBD-b-PDSS on guidelines patterned by nanoimprint lithography. A density multiplication factor of 4? was achieved through a hybrid chemo-/grapho-epitaxy process. Cross-sectional scanning tunneling electron microscopy/electron energy loss spectroscopy (STEM/EELS) was used to analyze the BCP profile in the DSA samples."

According to the news editors, the research concluded: "Wetting layers of parallel orientation were observed to form unless the bottom and top surface were neutralized with a surface treatment and top coat, respectively."

For more information on this research see: Directed Self-Assembly and Pattern Transfer of Five Nanometer Block Copolymer Lamellae. Acs Nano, 2017;():. (American Chemical Society - www.acs.org; Acs Nano - www.pubs.acs.org/journal/ancac3)

The news editors report that additional information may be obtained by contacting X. Yang, Media Research Center, Seagate Technology , 47488 Kato Road, Fremont, California 94538, United States. Additional authors for this research include X. Yang, M.J. Maher, G. Blachut, Y. Asano, Y. Someya, A. Mallavarapu, S.M. Sirard, C.J. Ellison and C.G Willson.

Keywords for this news article include: Fremont, California, United States, Nanotechnology, North and Central America.

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